GTV coating center for coating of sputter targets using multi-anode plasma process.
A special feature is the coating that is several centimeters thick, realised using special internal water cooling of the component carrier.
GTV Penta system for coating of sputter targets using multi-anode plasma process.
The 5-fold radial powder injection enables high powder feed rates (up to 500 g/min) with simultaneously high deposition rates and thus significantly reduced process times. The Penta torch is especially developed for coating of large components and replaces several standard plasma torches.